伪晶高电子迁移率晶体管的热电子诱导退化

Y. Tkachenko, C. Wei, J.C.M. Hwang, T. Harris, R. Grober, D. Hwang, L. Aucoin, S. Shanfield
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引用次数: 39

摘要

伪晶高电子迁移率晶体管已被发现经历热电子诱导的退化。由于热电子效应的负温度依赖性,有必要分别进行电气和温度应力测试,以确定这些晶体管在正常工作条件下的可靠性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hot-electron-induced degradation of pseudomorphic high-electron mobility transistors
Pseudomorphic high-electron mobility transistors have been found to undergo hot-electron-induced degradation. Due to the negative temperature dependence of hot-electron effects, it will be necessary to conduct electrical and temperature stress tests separately, in order to ascertain the reliability of these transistors under normal operating conditions.<>
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