难熔TiN, AlN和(Ti,Al)N涂层的光学性能

M. Bilokur, A. Gentle, M. Arnold, M. Cortie, G. Smith
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引用次数: 8

摘要

氮化钛是一种具有金属光学特性的金色半导体。它已广泛应用于室温光谱选择性涂层。相比之下,氮化铝是一种带隙相对较宽的非金属材料。这两种氮化物都具有优异的热稳定性,可达1000°C以上,但容易氧化。我们将在这里展示由这些材料及其复合氧化物组成的复合涂层在光谱选择应用方面具有相当大的潜力,包括在高温下。特别地,我们研究了磁控溅射产生的亚稳材料。这些材料的有效介电函数可以通过操纵其微观结构在很大范围内调节。这提供了一种使用“自下而上”方法组装具有可调谐介电功能的材料的策略。结果与传统的、“自上而下”的、由TiNx和AlN交替层组成的平面光学堆栈所能实现的结果进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical properties of refractory TiN, AlN and (Ti,Al)N coatings
Titanium nitride is a golden-colored semiconductor with metallic optical properties. It is already widely used in room temperature spectrally-selective coatings. In contrast, aluminum nitride is a relatively wide-band gap, non-metallic material. Both nitrides have exceptional thermal stability, to over 1000 °C, but are susceptible to oxidation. We will show here that composite coatings consisting of these materials and their complex oxides have considerable potential for spectrally-selective applications, including at elevated temperatures. In particular, we examine the metastable materials produced by magnetron sputtering. The effective dielectric functions of these materials can be tuned over a wide range by manipulation of their microstructure. This provides a strategy to assemble materials with tunable dielectric functions using a 'bottom-up' approach. The results are compared to those achievable by conventional, 'top-down', planar optical stacks comprised of alternating layers of TiNx and AlN.
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