{"title":"用于C.A.D.的半导体层共面线的台式计算机模型","authors":"R. Delrue, C. Seguinot, P. Pribetich, P. Kennis","doi":"10.1109/EUMA.1988.333963","DOIUrl":null,"url":null,"abstract":"For CAD simulation, it is necessary to determine the frequency behaviour of coplanar lines laid on semiconductor substrates. Exact analysis can be performed by using numerical technics such as S.D.A. or Mode Matching. However such analysis can not be included in C.A.D. programs. For this purpose, we present an original model for coplanar lines laid on semiconductor substrates, which take into account both the influence of thickness metallization and dielectric cap layer. The validity of our models is tested by comparison with mode matching and S.D.A. results.","PeriodicalId":161582,"journal":{"name":"1988 18th European Microwave Conference","volume":"84 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Desktop Computer Models for Coplanar Lines Laid on Semiconductor Layers for C.A.D.\",\"authors\":\"R. Delrue, C. Seguinot, P. Pribetich, P. Kennis\",\"doi\":\"10.1109/EUMA.1988.333963\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"For CAD simulation, it is necessary to determine the frequency behaviour of coplanar lines laid on semiconductor substrates. Exact analysis can be performed by using numerical technics such as S.D.A. or Mode Matching. However such analysis can not be included in C.A.D. programs. For this purpose, we present an original model for coplanar lines laid on semiconductor substrates, which take into account both the influence of thickness metallization and dielectric cap layer. The validity of our models is tested by comparison with mode matching and S.D.A. results.\",\"PeriodicalId\":161582,\"journal\":{\"name\":\"1988 18th European Microwave Conference\",\"volume\":\"84 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1988-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1988 18th European Microwave Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EUMA.1988.333963\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1988 18th European Microwave Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EUMA.1988.333963","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Desktop Computer Models for Coplanar Lines Laid on Semiconductor Layers for C.A.D.
For CAD simulation, it is necessary to determine the frequency behaviour of coplanar lines laid on semiconductor substrates. Exact analysis can be performed by using numerical technics such as S.D.A. or Mode Matching. However such analysis can not be included in C.A.D. programs. For this purpose, we present an original model for coplanar lines laid on semiconductor substrates, which take into account both the influence of thickness metallization and dielectric cap layer. The validity of our models is tested by comparison with mode matching and S.D.A. results.
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