智能像素的InGaAs收发器

D. Neilson, D. Goodwill, L. C. Wilkinson, F. Tooley, A. Walker, C. Stanley, M. Mcelhinney, F. Pottier
{"title":"智能像素的InGaAs收发器","authors":"D. Neilson, D. Goodwill, L. C. Wilkinson, F. Tooley, A. Walker, C. Stanley, M. Mcelhinney, F. Pottier","doi":"10.1364/optcomp.1995.otuc3","DOIUrl":null,"url":null,"abstract":"A promising route for the construction of smart pixels is to flip-chip bond III-V semiconductor devices as detectors[1] and modulators onto silicon circuitry. InGaAs quantum well devices grown on GaAs substrates and operating at around 1 μm provide a good option for the III-V devices since there are high power lasers available including Nd:YLF at 1047nm and substrate removal is not necessary. Silicon CMOS is attractive for the electronics since it is a mature technology, allows very high packing density and has the low power consumption necessary for systems based on many channels each with a high degree of smartness. In our work we have so far used 1 μm double metal n-well CMOS and future devices will be fabricated using 0.7/0.8 μm CMOS. The CMOS process limits the available voltage swing for driving the InGaAs modulators to 5 V.","PeriodicalId":302010,"journal":{"name":"Optical Computing","volume":"87 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"InGaAs Transceivers for Smart Pixels\",\"authors\":\"D. Neilson, D. Goodwill, L. C. Wilkinson, F. Tooley, A. Walker, C. Stanley, M. Mcelhinney, F. Pottier\",\"doi\":\"10.1364/optcomp.1995.otuc3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A promising route for the construction of smart pixels is to flip-chip bond III-V semiconductor devices as detectors[1] and modulators onto silicon circuitry. InGaAs quantum well devices grown on GaAs substrates and operating at around 1 μm provide a good option for the III-V devices since there are high power lasers available including Nd:YLF at 1047nm and substrate removal is not necessary. Silicon CMOS is attractive for the electronics since it is a mature technology, allows very high packing density and has the low power consumption necessary for systems based on many channels each with a high degree of smartness. In our work we have so far used 1 μm double metal n-well CMOS and future devices will be fabricated using 0.7/0.8 μm CMOS. The CMOS process limits the available voltage swing for driving the InGaAs modulators to 5 V.\",\"PeriodicalId\":302010,\"journal\":{\"name\":\"Optical Computing\",\"volume\":\"87 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Computing\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/optcomp.1995.otuc3\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Computing","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/optcomp.1995.otuc3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

构建智能像素的一个有前途的途径是将键合III-V半导体器件作为探测器[1]和调制器倒装到硅电路上。在GaAs衬底上生长并工作在1 μm左右的InGaAs量子阱器件为III-V器件提供了一个很好的选择,因为有高功率激光器可用,包括1047nm的Nd:YLF,并且不需要去除衬底。硅CMOS对电子产品具有吸引力,因为它是一种成熟的技术,允许非常高的封装密度,并且具有基于多个通道的系统所需的低功耗,每个通道都具有高度的智能。在我们的工作中,我们目前使用的是1 μm双金属n阱CMOS,未来的器件将使用0.7/0.8 μm CMOS。CMOS工艺将驱动InGaAs调制器的可用电压摆幅限制在5 V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
InGaAs Transceivers for Smart Pixels
A promising route for the construction of smart pixels is to flip-chip bond III-V semiconductor devices as detectors[1] and modulators onto silicon circuitry. InGaAs quantum well devices grown on GaAs substrates and operating at around 1 μm provide a good option for the III-V devices since there are high power lasers available including Nd:YLF at 1047nm and substrate removal is not necessary. Silicon CMOS is attractive for the electronics since it is a mature technology, allows very high packing density and has the low power consumption necessary for systems based on many channels each with a high degree of smartness. In our work we have so far used 1 μm double metal n-well CMOS and future devices will be fabricated using 0.7/0.8 μm CMOS. The CMOS process limits the available voltage swing for driving the InGaAs modulators to 5 V.
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