用于高压应用的轻质、耐用和多功能电绝缘材料系统

Euy-Sik Eugene Shin, D. Scheiman, M. Lizcano
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引用次数: 7

摘要

与单材料绝缘或商用SOA系统(如Teflon-Kapton-Teflon (TKT))相比,在相同的总厚度下,新开发的多层聚合物绝缘材料显著提高了介电击穿电压VB或介电强度K。迄今为止,几种候选材料(包括各种类型的Kapton PI和PFA或PET作为键合层(BL))的新结构的最大改进比Kapton PI单独薄膜高约61%,40.1 vs. 24.9 kV,这意味着绝缘厚度减少了86.3%,从而显着减少了最终系统的体积和重量。然而,值得注意的是,大多数多层结构的改进发生在更厚的总厚度上,高于~ 0.15 mm。广泛的分析还表明,多层结构的K随(i)与材料类型无关的单个层厚度的减少,(ii) PI总累积厚度或总PI/BL比的增加,以及(iii)界面数或总层数的增加而增加,但仅高于上述总厚度限制。多层结构的VB或K的增加与损伤演化和破坏模式直接相关。随着多层结构材料设计工艺的进一步优化,它有望实现其他多功能,如高局部放电(PD)电阻、提高耐用性、EMI屏蔽、高散热和高介电强度。这些新结构可用于各种高压和高温应用,例如未来的混合或全电动飞机布线和电力传输以及许多其他非航空航天大功率电缆,电子零部件,印刷电路板等。多层绝缘系统可以通过压光、压缩成型、冲压、层压、真空装袋和高压灭菌或3D打印,甚至是复杂的3D组件,轻松地加工和制造各种导体类型。基于其独特的结构形态和潜在的性能,将这种新型绝缘体系确定为微多层多功能电绝缘(MMEI)。MMEI概念和当前设计配置的专利申请已提交为期1年的临时申请(OAI-58834,序列号:58834)。: 62/659,234),等待转换为美国公用事业申请。本文详细介绍了MMEI的结构、介电性能分析、潜在机制和商业规模可行性评估。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Lightweight, Durable, and Multifunctional Electrical Insulation Material Systems for High Voltage Applications
Newly developed multilayer structures of well-known polymer insulation materials significantly improved dielectric breakdown voltage, VB, or dielectric strength, K, if well-bonded, when compared to those of single material insulations or the commercial SOA systems, such as Teflon-Kapton-Teflon (TKT), at the same overall thickness. To date, the greatest improvement of the new structures from a few candidate materials, including various types of Kapton PIs and PFA or PET as bond layer (BL), was about 61% higher than that of the Kapton PI alone films, 40.1 vs. 24.9 kV, which was translated to 86.3% decrease in insulation thickness, thus significant volume and weight reduction of the final system. However, it was of interest to note that most improvements of the multilayer structures occurred at thicker overall thicknesses, above ~ 0.15 mm. Extensive analyses also showed that K of the multilayer structures increased with (i) decreasing individual layer thickness regardless of material type, (ii) increasing total accumulated thickness of PI or overall PI/BL ratio, and (iii) increasing number of interface or total number of layers, but only above the aforementioned overall thickness limit. Increases in VB or K of the multilayer structures were directly correlated with damage evolution and failure mode. With further material-design-process optimizations of the multilayer structures, it was expected to achieve other multifunctionalities, such as high partial discharge (PD) resistance, improved durability, EMI shielding, and high thermal dissipation in addition to high dielectric strength. These new structures can be used in various high voltage and high temperature applications, such as future hybrid or all electric aircraft wiring and power transmission as well as many other non-aerospace high power cables, electronic parts and components, printed circuit board, and so forth. The multilayer insulation system can be easily processed and manufactured with various conductor types via calendaring, compression-molding, stamping, laminating, vacuum-bagging and autoclaving, or 3D printing, even for complex 3-D components. Based on their unique structural configurations and potential capabilities, the new insulation system was identified as micro-multilayer multifunctional electrical insulation (MMEI). Patent application of the MMEI concept and current design configurations was filed for a 1-year provisional application (OAI-58834, Serial No.: 62/659,234), pending conversion to a U.S. utility application. This paper presents details of the MMEI structures, their dielectric performance analyses, potential mechanisms, and commercial scaleup feasibility assessment.
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