垂直1.3 μ m光调制器在硅绝缘体上

X. Xiao, J. Sturm, P. Schwartz, K. Goel
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引用次数: 1

摘要

报道了一种新的1.3 μ m光强调制器,该调制器利用绝缘体上硅技术实现的法布里-珀罗谐振腔来实现高调制深度。在腔外放置一个p-i-n二极管调制器。1.3 μ m的光从顶部入射,在法布里-珀罗腔内来回反射,部分反射回来,部分透射过去。在共振时,反射率最小。前向偏置p-i-n二极管调制腔内激光的相位,并使腔的共振移位,使相位调制转换为强度调制。概述了器件的制造和测试。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Vertical 1.3 mu m optical modulator in silicon-on-insulator
Reported is a new optical intensity modulator at 1.3 mu m which utilizes a Fabry-Perot resonant cavity implemented by silicon-on-insulator technology to achieve a high modulation depth. A p-i-n diode modulator is placed outside the cavity. The 1.3 mu m light comes in from the top, bounces back-and-forth inside the Fabry-Perot cavity, and is partially reflected back and partially transmitted through. At resonance, the reflectance is minimized. Forward biasing the p-i-n diode modulates the phase of the laser light inside the cavity and shifts the resonance of the cavity to convert the phase modulation to intensity modulation. Device fabrication and testing are outlined.<>
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