{"title":"软x射线投影光学","authors":"D. Shafer","doi":"10.1364/sxray.1991.the1","DOIUrl":null,"url":null,"abstract":"There is a surprising variety of interesting optical designs for possible use in soft X-ray lithography. The requirements for the projection system are more difficult than those for the beam handling and mask illuminator optics, and it is only the projection optics that will be discussed here.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"331 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Soft X-ray projection optics\",\"authors\":\"D. Shafer\",\"doi\":\"10.1364/sxray.1991.the1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"There is a surprising variety of interesting optical designs for possible use in soft X-ray lithography. The requirements for the projection system are more difficult than those for the beam handling and mask illuminator optics, and it is only the projection optics that will be discussed here.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"331 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1991.the1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.the1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
There is a surprising variety of interesting optical designs for possible use in soft X-ray lithography. The requirements for the projection system are more difficult than those for the beam handling and mask illuminator optics, and it is only the projection optics that will be discussed here.
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