垂直互连使用通过封装孔(TEV)和通过硅孔(TSV),用于高频系统级封装集成

M. Wojnowski, K. Pressel, Gottfried Beer, A. Heinig, Michael Dittrich, J. Wolf
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引用次数: 7

摘要

在本文中,我们研究了高频系统级封装(SiP)集成的两种垂直互连选项:应用于嵌入式晶圆级球栅阵列(eWLB)技术的封装通孔(TEV)和硅通孔(TSV)。我们在尺寸和电气性能方面比较了两种解决方案。我们使用解析表达式和电磁模拟来进行分析,并给出了选定结构的测量结果进行验证。结果表明,TEV和TSV的选择取决于应用和成本窗口。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Vertical interconnections using through encapsulant via (TEV) and through silicon via (TSV) for high-frequency system-in-package integration
In this paper we investigate two vertical interconnect options for high-frequency system-in-package (SiP) integration: through encapsulant via (TEV) applied to the embedded wafer level ball grid array (eWLB) technology and through silicon via (TSV). We compare both solutions in terms of size and electrical performance. We use analytic expressions and electromagnetic simulations for our analysis and present measurement results of selected structures for verification. The results show that the choice of TEV and TSV depends on application and cost window.
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