{"title":"隐藏的生产力:如何从你的设备中获得更多","authors":"A. Kalir, Y. Nahum, A. Sharon","doi":"10.1109/ASMC.2012.6212926","DOIUrl":null,"url":null,"abstract":"In this paper, we present the use of a system aimed at improving the productivity of equipment, piloted at an Intel production facility for 300mm 45nm high volume manufacturing. We show that true toolset utilizations may be significantly lower than what is recorded, owing to various process and tool-related delays that occur during the tool `busy' or `running' state. We then demonstrate through a pilot case study how these delays were reduced by 37% and variation in delay was reduced 17-40% as well. This improvement represents an equivalent of up to 3-4% improvement in true utilization, far more than any single project or even aggregation of projects on the roadmap for availability improvement.","PeriodicalId":283238,"journal":{"name":"2012 SEMI Advanced Semiconductor Manufacturing Conference","volume":"53 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"The hidden productivity: How to get more out of your equipment\",\"authors\":\"A. Kalir, Y. Nahum, A. Sharon\",\"doi\":\"10.1109/ASMC.2012.6212926\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we present the use of a system aimed at improving the productivity of equipment, piloted at an Intel production facility for 300mm 45nm high volume manufacturing. We show that true toolset utilizations may be significantly lower than what is recorded, owing to various process and tool-related delays that occur during the tool `busy' or `running' state. We then demonstrate through a pilot case study how these delays were reduced by 37% and variation in delay was reduced 17-40% as well. This improvement represents an equivalent of up to 3-4% improvement in true utilization, far more than any single project or even aggregation of projects on the roadmap for availability improvement.\",\"PeriodicalId\":283238,\"journal\":{\"name\":\"2012 SEMI Advanced Semiconductor Manufacturing Conference\",\"volume\":\"53 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-05-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 SEMI Advanced Semiconductor Manufacturing Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2012.6212926\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 SEMI Advanced Semiconductor Manufacturing Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2012.6212926","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The hidden productivity: How to get more out of your equipment
In this paper, we present the use of a system aimed at improving the productivity of equipment, piloted at an Intel production facility for 300mm 45nm high volume manufacturing. We show that true toolset utilizations may be significantly lower than what is recorded, owing to various process and tool-related delays that occur during the tool `busy' or `running' state. We then demonstrate through a pilot case study how these delays were reduced by 37% and variation in delay was reduced 17-40% as well. This improvement represents an equivalent of up to 3-4% improvement in true utilization, far more than any single project or even aggregation of projects on the roadmap for availability improvement.