用于EUVL掩码检测的高亮度LDP源

Photomask Japan Pub Date : 2021-08-23 DOI:10.1117/12.2601995

K. Aoki, Yoshihiko Sato, Y. Teramoto, T. Shirai, S. Morimoto, H. Watanabe

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引用次数: 0

摘要

开发了激光辅助放电等离子体EUV光源，作为光化掩模检测和光束线应用的光源。由于采用聚焦激光照射点燃放电，LDP等离子体具有高亮度、高功率的独特特点。它可以在高达10 kHz的频率下工作，在等离子体中产生<200 W/mm2/sr的带内EUV亮度。该源的可靠性也在现场作为光化掩模检测源得到了验证。本文将讨论LDP源的关键性能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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High-brightness LDP source for EUVL mask inspection

The Laser-assisted discharge-produced (LDP) plasma EUV source was developed as a light source for actinic mask inspection and beamline application. Since the focused laser irradiation is used to ignite the discharge, the LDP plasma has a unique feature of high brightness and high power. It can be operated at the frequency of up to 10 kHz generating <200 W/mm2/sr in-band EUV brightness at plasma. The source reliability is also proven in the field as a source for actinic mask inspection. In the paper, the key performances of the LDP source will be discussed.

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Photomask Japan

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