OFZ法生长Sn掺杂Ga2O3(010)单晶的力学、结构、光学、电学和表面性能研究

Vijayan Ananthu, K. Akshita, Dhandapani Dhanabalan, S. M. Babu, S. Bhattacharya, E. Varadarajan
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引用次数: 0

摘要

本文主要研究了不同掺杂浓度0.05、0.1、0.2 wt%下未掺杂和锡掺杂β-Ga2O3单晶的生长。得到了(010)取向的单晶。所得晶体在近红外区完全透明,在可见光区和近紫外区继续保持透明。Sn掺杂β-Ga2O3后,n型电导率提高。这将对光电应用非常有用。测量了材料的机械、结构、光学、电学和表面性能。对未掺杂和掺锡Ga2O3单晶进行了粉末XRD、紫外可见光谱、显微维氏硬度、HR-XRD、AFM、霍尔测量等表征,并报道了结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Studies on the Mechanical, Structural, Optical, Electrical and Surface Properties of Sn Doped Ga2O3 (010) Single Crystals Grown by OFZ Technique
This research work focuses on the growth of single crystals of undoped and Sn doped β-Ga2O3 varying doping concentration of 0.05, 0.1, 0.2 wt% by Optical Floating Zone technique. Single crystals of (010) orientation were obtained. The obtained crystals were fully transparent in NIR region and the transparency continued in the visible region as well as in the near UV region. On doping Sn with β-Ga2O3, the n type conductivity increases. This will be useful for optoelectronic applications. The mechanical, structural, optical, electrical and surface properties were measured. Characterizations such as Powder XRD, UV-Vis spectroscopy, micro Vickers hardness, HR-XRD, AFM, hall measurement were done on undoped and Sn doped Ga2O3 single crystals and the results are reported.
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