GaN功率晶体管的高效工作模式,提供高达81%的效率和12W的输出功率

P. Wright, A. Sheikh, C. Roff, P. Tasker, J. Benedikt
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引用次数: 73

摘要

本文研究了在高功率水平下获得非常高的效率性能的反f类设计程序的发展。利用射频波形工程在器件电流发生器平面上获得高效率的反f类波形。对于宽带隙氮化镓HEMT晶体管和12W基频输出功率,在0.9 ghz和2.1GHz下实现了81%以上的漏极效率。通过增加漏极偏置电压来提高漏极效率的研究已经在2.1GHz下产生了高达84%的漏极效率。据作者所知,本研究中提出的效率是在这些频率下已发表的高功率GaN HEMT的最高测量效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Highly efficient operation modes in GaN power transistors delivering upwards of 81% efficiency and 12W output power
This paper investigates the development of an inverse class-F design procedure for obtaining very high efficiency performance at high power levels. RF waveform engineering was used to obtain high efficiency inverse class-F waveforms at the device current-generator plane. Drain efficiencies above 81% have been achieved at 0.9 and 2.1GHz for a wide band-gap gallium nitride (GaN) HEMT transistor and 12W fundamental output power. Investigations into improvements in drain efficiency through increases in drain bias voltage have yielded drain efficiencies of up to 84% at 2.1GHz. To the author’s knowledge, the efficiencies presented in this study are the highest published, measured efficiencies of a high power GaN HEMT at these frequencies.
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