采用喷墨打印技术制备了含氟氧化锡透明导电薄膜

Wan Zurina Samad, M. Salleh, A. Shafiee, M. Yarmo
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引用次数: 17

摘要

采用喷墨打印技术成功制备了FTO薄膜。采用SnCl4.5H2O和NH4F在60℃密闭容器中反应制备FTO前驱体。在玻璃基板上设置两层至五层的层数,并在室温下分别在25至27°C, 40°C和60°C沉积,以确定薄膜的最佳性能。利用VP-SEM进行形貌分析研究表明,随着沉积温度的升高,合金中存在20 ~ 30 nm大小的细小晶粒,并存在晶体形状。薄膜中氟浓度的XPS分析表明[F]/[Sn]比值为0.02,Sn d /2 Sn 4+, O1s为O2-, F1s为Sn-F键,结合能分别为486.6 eV, 530.5 eV和684.4 eV。光透过率分析表明,沉积温度提高了光透过率;60℃环境温度下60% T ~ 80% T, 40℃沉积薄膜的最佳透过率为91% T, 40℃、环境温度和60℃沉积薄膜的片电阻分别为16 Ω/□,21 Ω/□23 Ω/□。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transparent conducting thin films of fluoro doped tin oxide (FTO) deposited using inkjet printing technique
FTO thin films were successfully prepared by inkjet printing technique. FTO precursor was prepared by reacting SnCl4.5H2O and NH4F at 60°C in a sealed container. The number of layers was set up from two to five layers on the glass substrate and was deposited at room temperature around 25 to 27° C, 40° C and 60° C to determine the optimum properties for thin films performance. Morphology analysis study using VP-SEM shows the existence of fine grains with the size ranging 20 to 30 nm and the existence of crystal shape with the increases of deposition temperature. Fluorine concentration in the thin films determined from XPS analysis shows the ratio of[F]/[Sn] at 0.02 with the Sn d5/2 Sn 4+, O1s as O2-, and F1s as Sn-F bond peaks at binding energy 486.6 eV, 530.5 eV and 684.4 eV. The optical transmittance analysis showed the deposition temperature improved the optical transmittance; 60% T at ambient to 80% T at 60° C. The optimum optical transmittance was 91% T for the thin film deposited at 40° C. The sheet resistances were 16 Ω/□, 21 Ω/□ 23 Ω/□ for the thin film deposited at 40° C, ambient temperature and 60° C.
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