两个q波段功率放大器mmic在100纳米AlGaN/GaN HEMT技术

P. Feuerschütz, C. Friesicke, R. Lozar, S. Wagner, T. Maier, P. Brückner, R. Quay, A. Jacob
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引用次数: 2

摘要

提出了两种功率放大器(PA) MMIC设计,在37.5-42.5 GHz的q波段下行频段输出功率均大于1W。该电路采用Fraunhofer IAF 100 nm AlGaN/GaN工艺制造。第一种是采用微带线(MSL)技术的两级设计,第二种是采用接地共面波导(GCPW)技术的三级设计,可以实现有效的输出功率组合和q波段紧凑的布局。在39ghz频率下测量到的最大输出功率为2.1 W (33.2 dBm),功率增加效率(PAE)为14.7%,对应的功率密度为1.45 W/mm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Two Q-band power amplifier MMICs in 100 nm AlGaN/GaN HEMT technology
Two power amplifier (PA) MMIC designs with more than 1W of output power in the 37.5–42.5 GHz Q-band downlink band are presented. The circuits are manufactured using the Fraunhofer IAF 100 nm AlGaN/GaN process. The first one is a two-stage design in microstrip line (MSL) technology, whereas the second one is a three-stage design in grounded coplanar waveguide (GCPW) technology, which enables effective output power combining and compact layout at Q-band. A maximum output power of 2.1 W (33.2 dBm) is measured at 39 GHz with a power-added efficiency (PAE) of 14.7%, corresponding to a power density of 1.45 W/mm.
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