Y. Neo, Y. Suzuki, K. Sagae, H. Shimawaki, H. Mimura
{"title":"史密斯-珀塞尔辐射使用单尖端场发射器","authors":"Y. Neo, Y. Suzuki, K. Sagae, H. Shimawaki, H. Mimura","doi":"10.1116/1.1851536","DOIUrl":null,"url":null,"abstract":"Smith-Purcell radiation (SPR) was generated from a single-tip Si field emitter at a low power level. Single-tip Si field emitters were fabricated using reactive ion etching and thermal oxidation sharpening. Radiation measurements were performed through a viewing port in the visible spectra. SPR was successfully observed at 300-900 nm wavelength, 20-200 nA beam current and 25-30 kV accelerating voltage.","PeriodicalId":137345,"journal":{"name":"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Smith-Purcell radiation using a single-tip field emitter\",\"authors\":\"Y. Neo, Y. Suzuki, K. Sagae, H. Shimawaki, H. Mimura\",\"doi\":\"10.1116/1.1851536\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Smith-Purcell radiation (SPR) was generated from a single-tip Si field emitter at a low power level. Single-tip Si field emitters were fabricated using reactive ion etching and thermal oxidation sharpening. Radiation measurements were performed through a viewing port in the visible spectra. SPR was successfully observed at 300-900 nm wavelength, 20-200 nA beam current and 25-30 kV accelerating voltage.\",\"PeriodicalId\":137345,\"journal\":{\"name\":\"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)\",\"volume\":\"16 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-07-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/1.1851536\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/1.1851536","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Smith-Purcell radiation using a single-tip field emitter
Smith-Purcell radiation (SPR) was generated from a single-tip Si field emitter at a low power level. Single-tip Si field emitters were fabricated using reactive ion etching and thermal oxidation sharpening. Radiation measurements were performed through a viewing port in the visible spectra. SPR was successfully observed at 300-900 nm wavelength, 20-200 nA beam current and 25-30 kV accelerating voltage.