R. Schindler, A. Breymesser, H. Lautenschlager, C. Marckmann, S. Noel, U. Schubert
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Single step rapid thermal diffusion for selective emitter formation and selective oxidation
A novel method of forming selective emitters for Si solar cells is presented. Using spectral selection of the light used in rapid thermal processing (RTP), diffusion profiles can be tailored to variations desired in sheet resistance of emitters. Sheet resistance topography, secondary ion mass spectroscopy, reoxidation and minority carrier lifetime are discussed.