新型SOI技术中的带隙电压基准和温度传感器

S. Glab, M. Baszczyk, P. Dorosz, M. Idzik, W. Kucewicz, M. Sapor, Y. Arai, T. Miyoshi, P. Kapusta, A. Takeda
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引用次数: 0

摘要

提出了一种基于200nm SOI技术的带隙电压基准和绝对温度传感器(PTAT)。设计了三个略有不同的版本来验证SOI过程中可用的二极管模型。为了更广泛地研究SOI工艺,在三种不同的衬底上制作了芯片。带隙参考电路产生Vref = 1.27 V,片间扩展10mv。最佳带隙版本的温度系数为-35 μV/K。给出了电路设计、仿真以及与实测性能的比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Bandgap voltage reference and temperature sensor in novel SOI technology
A bandgap voltage reference together with absolute temperature sensor (PTAT) designed in 200 nm SOI technology is presented in this paper. Three slightly different versions were designed to verify the diode models available in the SOI process. For more extensive SOI process study the chip was fabricated on three different substrates. The bandgap reference circuit generates Vref = 1.27 V with 10 mV chip to chip spread. The best bandgap version has temperature coefficient -35 μV/K. Circuit design, simulations and comparison with measured performance are presented.
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