中红外应用中硅抗反射微结构的计算

Numerical Simulation of Optoelectronic Devices, 2014 Pub Date : 2014-10-27 DOI:10.1109/NUSOD.2014.6935342

Y. M. Song, K. S. Chang

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引用次数: 0

摘要

采用严格耦合波分析(RCWA)方法计算了中红外抗反射微结构(ams)的衍射效率。结果表明，ams的高度、周期和形状对反射的影响。我们还讨论了用于中红外应用的ams的最佳几何形状。

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Calculation of silicon antireflective microstructures for mid-infrared applications

Diffraction efficiencies of antireflective microstructures (AMSs) were calculated using a rigorous coupled wave analysis (RCWA) method for mid-infrared applications. The results show the effect of height, period, and shape of AMSs on the reflection. We also discuss optimum geometry of AMSs for mid-infrared application.

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Numerical Simulation of Optoelectronic Devices, 2014

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