束流不稳定性FFT分析

V. Katsap, R. Kendall, K. Saito
{"title":"束流不稳定性FFT分析","authors":"V. Katsap, R. Kendall, K. Saito","doi":"10.1109/IVELEC.2008.4556369","DOIUrl":null,"url":null,"abstract":"In shaped-beam mask writing tools, beam current is fairly small, often under 1 muA, with required stability of Lt1%. Beam is originated at the cathode, and passes thru multitude of electron-optical components before reaching target plane. Hence, beam current stability is affected by multiple factors, like power supplies, spurious electromagnetic fields, temperature, pressure, and the emitterpsilas own instability. We report results of analysis which allows us to uncover and separate environment-related beam current instabilities from emitter-related ones.","PeriodicalId":113971,"journal":{"name":"2008 IEEE International Vacuum Electronics Conference","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Beam current instability analysis with FFT\",\"authors\":\"V. Katsap, R. Kendall, K. Saito\",\"doi\":\"10.1109/IVELEC.2008.4556369\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In shaped-beam mask writing tools, beam current is fairly small, often under 1 muA, with required stability of Lt1%. Beam is originated at the cathode, and passes thru multitude of electron-optical components before reaching target plane. Hence, beam current stability is affected by multiple factors, like power supplies, spurious electromagnetic fields, temperature, pressure, and the emitterpsilas own instability. We report results of analysis which allows us to uncover and separate environment-related beam current instabilities from emitter-related ones.\",\"PeriodicalId\":113971,\"journal\":{\"name\":\"2008 IEEE International Vacuum Electronics Conference\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE International Vacuum Electronics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVELEC.2008.4556369\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Vacuum Electronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVELEC.2008.4556369","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

在异形光束掩模书写工具中,光束电流相当小,通常在1mua以下,需要Lt1%的稳定性。光束起源于阴极,在到达目标平面之前要经过众多的电子光学元件。因此,束流稳定性受到多种因素的影响,如电源、伪电磁场、温度、压力和发射器本身的不稳定性。我们报告了分析结果,这使我们能够发现和分离与环境相关的光束电流不稳定性和与发射器相关的不稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Beam current instability analysis with FFT
In shaped-beam mask writing tools, beam current is fairly small, often under 1 muA, with required stability of Lt1%. Beam is originated at the cathode, and passes thru multitude of electron-optical components before reaching target plane. Hence, beam current stability is affected by multiple factors, like power supplies, spurious electromagnetic fields, temperature, pressure, and the emitterpsilas own instability. We report results of analysis which allows us to uncover and separate environment-related beam current instabilities from emitter-related ones.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信