基于0.5µm CMOS工艺的LDMOS-SCR等效电路模型验证

Zeyu Zhong, Xiangliang Jin
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引用次数: 1

摘要

基于0.5µm CMOS工艺设计制造的LDMOS-SCR,应用并验证了ESD保护的SCR等效电路模型。仿真结果与TLP 1-V曲线具有较高的一致性。它为ESD保护的可控硅器件的仿真方法做出了贡献。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Verification of an Equivalent Circuit Model for LDMOS-SCR Based on 0.5 µm CMOS Process
Based on a LDMOS-SCR designed and manufactured in 0.5µm CMOS process, a SCR equivalent circuit model for ESD protection is applied and verified. Simulation results show a high consistency with the TLP 1-V curve. It contributes to the simulation methodology of SCR devices for ESD protection.
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