一种单片高功率ka波段PIN开关

J. Bellantoni, D. Bartle, D. Payne, G. McDermott, S. Bandla, R. Tayrani, L. Raffaelli
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引用次数: 20

摘要

提出了一种采用单片砷化镓外延p-i-n二极管技术的高功率ka波段单极双掷开关。该开关在分流配置中采用外延垂直p-i-n二极管结构,针对高功率信号条件下的低损耗和高隔离进行了优化。垂直外延结构在正向偏压下提供较低的射频阻抗和优越的功率处理能力。该电路的另一个特点是p-i-n二极管直接位于射频线路下方,从而提高了隔离性并增加了带宽。35 GHz时的插入损耗为0.7 dB, 30 ~ 40 GHz时的隔离度优于32 dB。功率处理能力至少为+ 38dbm脉冲和+ 35dbm连续波。开关速度上升和下降时间为2ns .>
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A monolithic high power Ka-band PIN switch
A high-power Ka-band single-pole double-throw (SPDT) switch using monolithic GaAs epitaxial p-i-n diode technology is presented. The switch uses epitaxial vertical p-i-n diode structures in a shunt configuration optimized for low loss and high isolation under high power signal conditions. The vertical epitaxial structure provides lower RF impedance under forward bias and superior power handling capability. An additional feature of the circuit is the location of the p-i-n diode directly underneath the RF line, which improves isolation and increases bandwidth. Insertion loss is 0.7 dB at 35 GHz, and isolation is better than 32 dB from 30 to 40 GHz. The power-handling capability is at least +38 dBm pulsed and +35 dBm CW. Switching speed rise and fall times are 2 ns.<>
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