{"title":"基于0.5µm CMOS工艺的DDSCR器件结构","authors":"Xiangliang Jin, Yang Wang","doi":"10.23919/IEDS48938.2021.9468852","DOIUrl":null,"url":null,"abstract":"Dual Direction Silicon Controlled Rectifier(DDSCR) are primarily used for ESD protection in high voltage environments. According to the results of the device test, the trigger voltage and the sustain voltage of the DDSCR are 17.62V and 9.54V, respectively. Finally, by changing the important dimensions of the DDSCR, the ESD characteristics of the device can be significantly improved.","PeriodicalId":174954,"journal":{"name":"2020 International EOS/ESD Symposium on Design and System (IEDS)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"DDSCR Device Structure Fabricated on 0.5 µm CMOS Process\",\"authors\":\"Xiangliang Jin, Yang Wang\",\"doi\":\"10.23919/IEDS48938.2021.9468852\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Dual Direction Silicon Controlled Rectifier(DDSCR) are primarily used for ESD protection in high voltage environments. According to the results of the device test, the trigger voltage and the sustain voltage of the DDSCR are 17.62V and 9.54V, respectively. Finally, by changing the important dimensions of the DDSCR, the ESD characteristics of the device can be significantly improved.\",\"PeriodicalId\":174954,\"journal\":{\"name\":\"2020 International EOS/ESD Symposium on Design and System (IEDS)\",\"volume\":\"17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-06-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 International EOS/ESD Symposium on Design and System (IEDS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/IEDS48938.2021.9468852\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International EOS/ESD Symposium on Design and System (IEDS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/IEDS48938.2021.9468852","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
DDSCR Device Structure Fabricated on 0.5 µm CMOS Process
Dual Direction Silicon Controlled Rectifier(DDSCR) are primarily used for ESD protection in high voltage environments. According to the results of the device test, the trigger voltage and the sustain voltage of the DDSCR are 17.62V and 9.54V, respectively. Finally, by changing the important dimensions of the DDSCR, the ESD characteristics of the device can be significantly improved.