亚ps兆赫兹绿色激光对空气中介质涂层的污染

Laser Damage Pub Date : 2022-12-02 DOI:10.1117/12.2642516

M. Stehlik, J. Zideluns, F. Wagner, F. Lemarchand, Camille Petite, A. Moreau, A. Lereu, M. Minissale, J. Lumeau, L. Gallais

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引用次数: 0

摘要

激光诱导污染(Laser-induced pollution, LIC)会降低光学元件的性能，导致光学损耗甚至激光损伤。LIC沉积层的形成限制了高重复率工业激光器的可靠运行。本文研究了在515 nm波长的MHz亚ps激光照射下，介质氧化物薄膜上LIC的生长。我们研究了薄膜沉积方法、薄膜材料和薄膜厚度对LIC生长动态的影响。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Sub-ps MHz green laser-induced contamination on dielectric coatings in air

Laser-induced contamination (LIC) degrades the performance of optical components and can result in optical losses or even laser-induced damage. LIC deposit formation limits reliable operation of high repetition rate industrial lasers. In this work, we investigate LIC growth on dielectric oxide thin films in air environment irradiated by MHz sub-ps laser at 515 nm. We study the LIC growth dynamic in dependence on thin film deposition method, thin film material and thin film thickness.

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Laser Damage

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