基于CMOS-MEMS集成电流反射传感的MOSFET嵌入式压力传感器的设计与优化

P. Rathore, B. Panwar
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引用次数: 13

摘要

本文报道了一种基于电流反射传感的MOSFET嵌入式压力传感器的设计与优化。采用标准的5 μη i CMOS技术,设计了一种基于电阻负载n沟道MOSFET的电流反射电路,并集成了压力传感MOSFET。利用MOSFET的压阻效应计算外压作用下应变诱导载流子迁移率的变化。有源MOSFET的沟道区域形成尺寸为100 μm × 100 μm × 2.5 μm的柔性膜片,在施加压力下发生偏转。利用基于COMSOL Multiphysics的有限元方法对压力传感器进行仿真。使用T-Spice来评估电流镜压力传感电路的特性。仿真结果表明,该MOSFET嵌入式压力传感器的灵敏度约为。10.01 mV / MPa。对压力传感结构进行了优化,使传感器灵敏度提高到大约。473 mV / MPa。此外,由于(a)有源和无源器件的失配,以及(b)工作温度和电源电压的变化,电流镜mosfet的漏极电流的变化也进行了研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and optimization of a CMOS-MEMS integrated current mirror sensing based MOSFET embedded pressure sensor
This paper reports on the design and optimization of a current mirror sensing based MOSFET embedded pressure sensor. A resistive loaded n-channel MOSFET based current mirror circuit integrated with a pressure sensing MOSFET was designed using standard 5 μηι CMOS technology. The piezoresistive effect in MOSFET has been exploited for the calculation of strain induced carrier mobility variation under externally applied pressure. The channel region of the active MOSFET forms a flexible diaphragm of size 100 μm × 100 μm × 2.5 μm which deflects under applied pressure. Finite element method based COMSOL Multiphysics is utilized for the simulation of pressure sensor. T-Spice is employed to evaluate the characteristics of the current mirror pressure sensing circuitry. Simulation results show that the MOSFET embedded pressure sensor has a sensitivity of approx. 10.01 mV/MPa. The pressure sensing structure has been optimized for enhancing the sensor sensitivity to approx. 473 mV/MPa. In addition, the variation in the drain currents of the current mirror MOSFETs due to the (a) mismatch of the active and passive devices, and (b) variations in operating temperature and supply voltage have also been investigated.
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