离子注入纳米硅在二氧化硅中的超快三阶非线性紫外响应

C. Torres‐Torres, J. Bornacelli, J. Cheang-Wong, L. Rodríguez-Fernández, A. Oliver
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引用次数: 0

摘要

本文描述了在高纯度二氧化硅基体中成核的硅纳米颗粒所表现出的非线性紫外线透射率的评价。饱和吸收是造成纳秒级非线性紫外吸收的主要物理机制。利用Nd:YAG激光系统的三次谐波脉冲进行了单光束透射率实验。利用两能级模型估计了纳米粒子的超快光学响应。强调了样品控制纳米光子信号的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultrafast third-order nonlinear ultraviolet response exhibited by ion-implanted silicon nanoparticles in silica
Described herein is the evaluation of the nonlinear ultraviolet transmittance exhibited by Silicon nanoparticles nucleated in a high-purity silica matrix. A saturated absorption was identified as the main physical mechanism responsible for the nonlinear ultraviolet absorption in a nanosecond regime. A single-beam transmittance experiment was carried out with pulses provided by the third harmonic of a Nd:YAG laser system. A two-level model led us to estimate the ultrafast optical response of the nanoparticles. It is highlighted the potential of the sample to control nanophotonic signals.
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