双栅mosfet表面粗糙度效应的全三维实空间模拟

C. Buran, M. Pala, M. Mouis, S. Poli
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引用次数: 3

摘要

本文基于全三维自洽泊松-薛定谔算法在实空间非平衡格林函数(NEGF)方法中对双栅(DG)- mosfet进行了数值模拟。我们通过指数自相关定律包含了表面粗糙度(SR)的几何描述。为了模拟粗糙的平面结构,我们沿其中一个横向方向采用周期边界条件。在空间波动均方根(RMS)的不同实际值下计算了传递特性,而在减去弹道分量后从有效迁移率中提取的sr限制迁移率与反转电荷密度呈非单调依赖关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Full-3D Real-Space Simulation of Surface-Roughness Effects in Double-Gate MOSFETs
We present numerical simulations of double-gate (DG)-MOSFETs based on a full-3D self-consistent Poisson-Schrodinger algorithm within the real-space non equilibrium Green's function (NEGF) approach. We include a geometrical description of surface roughness (SR) via an exponential auto-correlation law. In order to simulate rough planar structures we adopt periodic boundary conditions along one of the transverse directions. Transfer characteristics are computed for different realistic values of the root mean square (RMS) of spatial fluctuations whereas SR-limited mobility, which is extracted from effective mobility after subtraction of the ballistic component, presents a non monotonic dependence on the inversion charge density.
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