R. K. Nanda, Tara Prasanna Dash, Sanghamitra Das, C. K. Maiti
{"title":"硅-锗HBTs的噪声特性","authors":"R. K. Nanda, Tara Prasanna Dash, Sanghamitra Das, C. K. Maiti","doi":"10.1109/ICMOCE.2015.7489747","DOIUrl":null,"url":null,"abstract":"Coupled process and device simulations have been applied to study the microwave noise performance of high frequency Silicon-Germanium heterojunction bipolar transistors. The detrimental effects of noise in advanced strain-engineered bipolar devices with highly scaled device dimensions are discussed in detail. Y-parameter based technique has been used to extract the noise parameters of bipolar transistors to account for the correlation between the base and collector shot noise.","PeriodicalId":352568,"journal":{"name":"2015 International Conference on Microwave, Optical and Communication Engineering (ICMOCE)","volume":"83 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Noise characterization of Silicon-Germanium HBTs\",\"authors\":\"R. K. Nanda, Tara Prasanna Dash, Sanghamitra Das, C. K. Maiti\",\"doi\":\"10.1109/ICMOCE.2015.7489747\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Coupled process and device simulations have been applied to study the microwave noise performance of high frequency Silicon-Germanium heterojunction bipolar transistors. The detrimental effects of noise in advanced strain-engineered bipolar devices with highly scaled device dimensions are discussed in detail. Y-parameter based technique has been used to extract the noise parameters of bipolar transistors to account for the correlation between the base and collector shot noise.\",\"PeriodicalId\":352568,\"journal\":{\"name\":\"2015 International Conference on Microwave, Optical and Communication Engineering (ICMOCE)\",\"volume\":\"83 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 International Conference on Microwave, Optical and Communication Engineering (ICMOCE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMOCE.2015.7489747\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 International Conference on Microwave, Optical and Communication Engineering (ICMOCE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMOCE.2015.7489747","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Coupled process and device simulations have been applied to study the microwave noise performance of high frequency Silicon-Germanium heterojunction bipolar transistors. The detrimental effects of noise in advanced strain-engineered bipolar devices with highly scaled device dimensions are discussed in detail. Y-parameter based technique has been used to extract the noise parameters of bipolar transistors to account for the correlation between the base and collector shot noise.