{"title":"电感耦合Cl2/O2等离子体中Pb(Zr,Ti)O3的Pt/RuO2电极的图形化","authors":"S. Park, J. Lee, H. Jung, M. Jeon, D. Choi","doi":"10.1109/ESSDERC.1997.194537","DOIUrl":null,"url":null,"abstract":"Inductively coupled plasma excited by a helical antenna is used to pattern Pt/RuOz electrodes for PZT. The hybrid electrode of thin Pt on thicker RuOz layer has been studied because of good leakage current characteristics of Pt and easy etch characteristics of RuOz. The etch rates and selectivities to oxide hard mask have been measured for each of Pt and RuOz in terms of <nICh mixture ratio. The ratio of 10% Cl and 90%· Oz has been chosen for the optimum condition, and patterning of sub-half micron electrodes is demonstrated.","PeriodicalId":424167,"journal":{"name":"27th European Solid-State Device Research Conference","volume":"54 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-09-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Patterning of Pt/RuO2 electrodes for Pb(Zr,Ti)O3 in an Inductively Coupled Cl2/O2 Plasma\",\"authors\":\"S. Park, J. Lee, H. Jung, M. Jeon, D. Choi\",\"doi\":\"10.1109/ESSDERC.1997.194537\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Inductively coupled plasma excited by a helical antenna is used to pattern Pt/RuOz electrodes for PZT. The hybrid electrode of thin Pt on thicker RuOz layer has been studied because of good leakage current characteristics of Pt and easy etch characteristics of RuOz. The etch rates and selectivities to oxide hard mask have been measured for each of Pt and RuOz in terms of <nICh mixture ratio. The ratio of 10% Cl and 90%· Oz has been chosen for the optimum condition, and patterning of sub-half micron electrodes is demonstrated.\",\"PeriodicalId\":424167,\"journal\":{\"name\":\"27th European Solid-State Device Research Conference\",\"volume\":\"54 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-09-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"27th European Solid-State Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSDERC.1997.194537\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"27th European Solid-State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.1997.194537","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Patterning of Pt/RuO2 electrodes for Pb(Zr,Ti)O3 in an Inductively Coupled Cl2/O2 Plasma
Inductively coupled plasma excited by a helical antenna is used to pattern Pt/RuOz electrodes for PZT. The hybrid electrode of thin Pt on thicker RuOz layer has been studied because of good leakage current characteristics of Pt and easy etch characteristics of RuOz. The etch rates and selectivities to oxide hard mask have been measured for each of Pt and RuOz in terms of
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