脉冲激光沉积:一种合成先进功能材料的灵活工具

M. Chaker
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引用次数: 0

摘要

材料科学和工程的创新在于我们能够通过控制纳米结构来设计具有定制特性(电、光、磁等)的新材料。在这样的尺度上独特排列物质的最有力手段之一是使用等离子体,因为等离子体具有同时提供各种不同能量的粒子(如离子、中性原子和自由基)的独特能力。在本次演讲中,我们将重点介绍使用脉冲激光沉积(PLD)技术合成金属绝缘体过渡(MIT)材料,该技术可以很好地控制材料的化学计量和密度以及材料的纳米结构。二氧化钒(VO2)和镍酸钐(SmNiO3)是特别有趣的MIT材料,因为它们的电阻率以及它们的红外和太赫兹(THz)反射率在热/光诱导的MIT中发生显著变化,在转变温度分别为TMIT≈68°C和130°C。在一系列的研究中,我们的团队研究了VO2和SmNiO3薄膜的MIT的物理控制,并探索了新的应用机会,包括非冷却热辐射计和用于空间应用的智能散热器设备。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pulsed Laser Deposition: A Flexible Tool for the Synthesis of Advanced Functional Materials
Innovation in materials science and engineering resides in our ability to design new materials with tailored properties (electri cal, optical, magnetic, etc.) by controlling their nanostructure. One of the most powerful means to uniquely arrange matter at such scale is to use plasmas due to their unique ability to provi de simultaneously a variety of particles with different energies such as ions, neutral atoms and radicals. In this presentation, w e will focus on the synthesis of metal insulator transition (MIT) materials using the Pulsed Laser Deposition (PLD) tech nique that allows an excellent control of material stoichiometr y and density as well as of the material nanostructure. Vanadiu m dioxide (VO2) and samarium nickelate (SmNiO3) are particularly interesting MIT materials as their electrical resistivity as well as their infrared and terahertz (THz) reflectivity undergo significant changes across the thermo/photo-induced MIT, at transition temperatures TMIT ≈ 68 °C and 130 °C respectively. In a series of investigations, our group has examined the physics governing the MIT of VO2 and SmNiO3 thin films and has explored new application opportunities including uncooled bolometers, and smart radiator devices for space applications.
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