{"title":"中隙波长为1.55 /spl μ m的三维光子晶体的制备","authors":"M. Qi, S. Johnson, J. Joannopoulos, H. L. Smith","doi":"10.1109/QELS.2003.238455","DOIUrl":null,"url":null,"abstract":"Seven-functional-layer 3D photonic crystals with midgap wavelength at 1.55 /spl mu/m were fabricated with a layer-by-layer approach. We employed e-beam lithography to align and define the pattern, reactive-ion-etching to transfer the pattern, and spin-on-dielectrics to planarize the surface. Four such cycles were sufficient to complete the fabrication.","PeriodicalId":432096,"journal":{"name":"Conference on Lasers and Electro-Optics, 2003. CLEO '03.","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Fabrication of three-dimensional photonic crystals with midgap wavelength at 1.55 /spl mu/m\",\"authors\":\"M. Qi, S. Johnson, J. Joannopoulos, H. L. Smith\",\"doi\":\"10.1109/QELS.2003.238455\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Seven-functional-layer 3D photonic crystals with midgap wavelength at 1.55 /spl mu/m were fabricated with a layer-by-layer approach. We employed e-beam lithography to align and define the pattern, reactive-ion-etching to transfer the pattern, and spin-on-dielectrics to planarize the surface. Four such cycles were sufficient to complete the fabrication.\",\"PeriodicalId\":432096,\"journal\":{\"name\":\"Conference on Lasers and Electro-Optics, 2003. CLEO '03.\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference on Lasers and Electro-Optics, 2003. CLEO '03.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/QELS.2003.238455\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference on Lasers and Electro-Optics, 2003. CLEO '03.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/QELS.2003.238455","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fabrication of three-dimensional photonic crystals with midgap wavelength at 1.55 /spl mu/m
Seven-functional-layer 3D photonic crystals with midgap wavelength at 1.55 /spl mu/m were fabricated with a layer-by-layer approach. We employed e-beam lithography to align and define the pattern, reactive-ion-etching to transfer the pattern, and spin-on-dielectrics to planarize the surface. Four such cycles were sufficient to complete the fabrication.