纳米硅材料中载流子动量的降维效应

K. Nakamura
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引用次数: 2

摘要

利用第一性原理Kohn-Sham轨道分析了三维体硅和低维硅纳米结构中载流子的动量。在k坐标系下计算了导带中电子动量的量子力学期望值,并根据动量的行为讨论了量纲限制。厚度约为5 nm的硅(001)纳米片的导电带结构在动量态上可以追溯到体硅的多谷结构,而小于2 nm的动量态不能与体硅的多谷结构相连接。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dimensional reduction effect on momentum of carrier electrons in nanoscale silicon materials
The momenta of carrier electrons in three-dimensional bulk silicon and low-dimensional silicon nano-structures have been analyzed by means of first-principles Kohn-Sham orbitals. Quantum-mechanical expectation values of the momentum of electrons in the conduction band have been calculated with respect to k coordinate, and the dimensional confinement has been discussed based on the behavior of the momentum. The conduction-band structure of silicon(001) nanosheet with about 5 nm thickness traces back to the multivalley one of bulk silicon in terms of the momentum state, while the momentum state for less than 2 nm cannot connect with that of bulk silicon.
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