氮化镓(GaN)和宽带隙(WBG)器件的脉冲偏置脉冲射频谐波负载拉

Steve Dudkiewicz
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引用次数: 7

摘要

有史以来第一次,商业上可用的脉冲偏置脉冲射频谐波负载牵引系统被提供给高功率和宽带隙设备。脉冲直流偏置与脉冲射频相结合,通过最大限度地减少自热和捕获来减少缓慢(长期)记忆效应,从而更真实地观察晶体管的工作条件。在脉冲偏置脉冲射频条件下进行的I V, s参数和负载拉力测量为高功率脉冲应用提供了更准确和有意义的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pulsed-bias pulsed-RF harmonic load pull for Gallium Nitride (GaN) and wide band-gap (WBG) devices
For the first time ever, a commercially available pulsed-bias pulsed-RF harmonic load pull system is being offered for high power and wide band-gap devices. Pulsing DC bias in conjunction with pulsing RF reduces slow (long-term) memory effects by minimizing self-heating and trapping, giving a more realistic observance of transistor operating conditions. I V, S-Parameter and Load Pull measurements taken under pulsed-bias pulsed-RF conditions give more accurate and meaningful results for high-power pulsed applications.
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