高压下Te杂质谱线的异常应力位移

U. Steigenberger, M. Eremets, S. G. Lapin, M. Ortenberg, Yu. V. Kosichkin
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引用次数: 0

摘要

对于初等半导体碲,静水应力和单轴应力的影响在许多方面是互补的。然而,在静水压力下,晶格细胞的螺旋链被压在一起,并沿着对称轴略微膨胀,而在沿对称轴的单轴压力下,情况恰恰相反。电子能带态的互补畸变很好地反映了这种行为,并在回旋共振实验[1]中得到了证实。本研究探讨了是否同样的互补情况也适用于浅杂质体系,并最终提供了一种工具,为仍然存在的不同杂质过渡的识别。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Anomalous Stress Shift of Impurity Lines in Te under High Pressure
For the elementary semiconductor Tellurium the effects of hydrostatic and uniaxial stress are in many aspects complementary. Whereas for hydrostatic pressure the helical chains of the lattice cell are pressed together and slightly expanded along the symmetry axis, for uniaxial stress along this axis holds exactly the opposite. This behaviour is well reflected by the complementary distortion of the electronic energy band states and has been confirmed experimentally by cyclotron resonance experiments [1]. The present study investigates whether the same complementary situation holds also for the shallow impurity system and provides eventually a tool for the still remaining identification of the different impurity transitions.
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