C. Jiang, Weidong Yang, Lijuan Wang, Dawen Wang, C. Bai
{"title":"光刻胶预刻槽结构的研究","authors":"C. Jiang, Weidong Yang, Lijuan Wang, Dawen Wang, C. Bai","doi":"10.1117/12.150656","DOIUrl":null,"url":null,"abstract":"Theoretical and experimental profiles of pregrooved cross-section in coated photoresist layers with a thickness of 470 nm and 150 nm on glass substrates are given. The experiment has been performed on the photoresist cutting machine using focused argon laser beam and AZ-1350 photoresist. The results from scanning tunneling microscope (STM) and scanning electron microscope (SEM) images are also discussed.","PeriodicalId":212484,"journal":{"name":"Optical Storage and Information Data Storage","volume":"198 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Study of photoresist pregrooved structures\",\"authors\":\"C. Jiang, Weidong Yang, Lijuan Wang, Dawen Wang, C. Bai\",\"doi\":\"10.1117/12.150656\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Theoretical and experimental profiles of pregrooved cross-section in coated photoresist layers with a thickness of 470 nm and 150 nm on glass substrates are given. The experiment has been performed on the photoresist cutting machine using focused argon laser beam and AZ-1350 photoresist. The results from scanning tunneling microscope (STM) and scanning electron microscope (SEM) images are also discussed.\",\"PeriodicalId\":212484,\"journal\":{\"name\":\"Optical Storage and Information Data Storage\",\"volume\":\"198 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-08-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Storage and Information Data Storage\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.150656\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Storage and Information Data Storage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.150656","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Theoretical and experimental profiles of pregrooved cross-section in coated photoresist layers with a thickness of 470 nm and 150 nm on glass substrates are given. The experiment has been performed on the photoresist cutting machine using focused argon laser beam and AZ-1350 photoresist. The results from scanning tunneling microscope (STM) and scanning electron microscope (SEM) images are also discussed.
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