基于集成深度学习的条纹模式分析

Shijie Feng, Yile Xiao, Wei Yin, Yan Hu, Yixuan Li, C. Zuo, Qian Chen
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引用次数: 1

摘要

摘要近年来,基于深度学习的光学测量方法的发展取得了巨大的进展,这些方法引入了各种深度神经网络(dnn)来完成许多光学测量任务,如条纹分析、相位解包裹和数字图像相关。然而,由于不同的DNN模型有各自的优势和局限性,单个DNN很难在所有可能的场景下做出可靠的预测。在这项工作中,我们将集成学习引入光学测量,将多个深度神经网络的预测结合起来,显著提高了条纹模式分析任务的精度,降低了泛化误差。首先,选择几种最先进的不同架构的基础模型。提出了一种K-fold平均集成策略,利用不同的数据对每个基本模型进行多次训练,并计算每个基本模型内的平均预测。接下来,提出了一种自适应集成策略,通过构建额外的深度神经网络,以自适应和全自动的方式融合从这些平均预测中提取的特征,进一步组合基本模型。实验结果表明,集成学习可以获得优于最先进的解决方案的性能,包括经典和传统的基于单dnn的方法。我们的工作表明,通过集体智慧,集成学习为克服泛化挑战提供了一种简单有效的解决方案,并提高了数据驱动的光学计量方法的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fringe-pattern analysis with ensemble deep learning
Abstract. In recent years, there has been tremendous progress in the development of deep-learning-based approaches for optical metrology, which introduce various deep neural networks (DNNs) for many optical metrology tasks, such as fringe analysis, phase unwrapping, and digital image correlation. However, since different DNN models have their own strengths and limitations, it is difficult for a single DNN to make reliable predictions under all possible scenarios. In this work, we introduce ensemble learning into optical metrology, which combines the predictions of multiple DNNs to significantly enhance the accuracy and reduce the generalization error for the task of fringe-pattern analysis. First, several state-of-the-art base models of different architectures are selected. A K-fold average ensemble strategy is developed to train each base model multiple times with different data and calculate the mean prediction within each base model. Next, an adaptive ensemble strategy is presented to further combine the base models by building an extra DNN to fuse the features extracted from these mean predictions in an adaptive and fully automatic way. Experimental results demonstrate that ensemble learning could attain superior performance over state-of-the-art solutions, including both classic and conventional single-DNN-based methods. Our work suggests that by resorting to collective wisdom, ensemble learning offers a simple and effective solution for overcoming generalization challenges and boosts the performance of data-driven optical metrology methods.
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