高能粒子辐照在0.5 /spl mu/m BiCMOS多晶硅发射极双极晶体管中的效应

E. Simoen, S. Decoutere, B. Merron, L. Deferm, C. Claeys, G. Berger, G. Ryckewaert, H. Ohyama, H. Sunaga
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引用次数: 0

摘要

首次研究了以0.5 /spl μ m BiCMOS工艺制备的多晶硅发射极双极结晶体管在高能电子和质子辐照下的降解问题。本研究中主要关注的参数是基极I/sub B/和集电极电流I/sub C/ (Gummel图),电流增益/spl beta/和基极电流噪声谱密度S(I/sub B/)。在低基极-发射极电压下,1-MeV的电子辐照首先引起非理想基极电流的增加。与此相关的是增益的降低和外围闪烁或1/f噪声分量的增加。在59mev质子辐照下,所研究的整个电压范围内I/sub C/和I/sub B/均下降,闪烁噪声相应增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-energy particle irradiation effects in 0.5 /spl mu/m BiCMOS polysilicon emitter bipolar junction transistors
The degradation of polysilicon emitter bipolar junction transistors fabricated in a 0.5 /spl mu/m BiCMOS technology, which are subjected to high-energy electron and proton irradiations is explored for the first time. The parameters of primary interest in this study are the base I/sub B/ and collector current I/sub C/ (Gummel plot), the current gain /spl beta/ and the base current noise spectral density S(I/sub B/). 1-MeV electron irradiation in first instance causes an increase of the non-ideal base current at small base-emitter voltages. Associated with this is a reduction of the gain and an increase of the peripheral flicker or 1/f noise component. The 59 MeV proton irradiations cause a degradation of both I/sub C/ and I/sub B/ in the whole voltage range studied and a corresponding increase of flicker noise.
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