金属法兰开放式同轴线在导体背衬介质层中的终端研究

S. Fan, D. Misra
{"title":"金属法兰开放式同轴线在导体背衬介质层中的终端研究","authors":"S. Fan, D. Misra","doi":"10.1109/IMTC.1990.65956","DOIUrl":null,"url":null,"abstract":"A spectral domain approach is used to analyze aperture fields and aperture admittance of an open-ended coaxial line terminated by a conductor-backed dielectric layer. The aperture admittance and capacitance at various frequencies and thicknesses are calculated for various dielectrics. It is shown that, for d>or=2b, the results are very close to those for the infinitely thick dielectric medium. The results are expected to be useful in developing suitable procedures for measuring the electrical properties of samples with small thicknesses.<<ETX>>","PeriodicalId":404761,"journal":{"name":"7th IEEE Conference on Instrumentation and Measurement Technology","volume":"70 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-02-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"A study on the metal-flanged open-ended coaxial line terminating in a conductor-backed dielectric layer\",\"authors\":\"S. Fan, D. Misra\",\"doi\":\"10.1109/IMTC.1990.65956\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A spectral domain approach is used to analyze aperture fields and aperture admittance of an open-ended coaxial line terminated by a conductor-backed dielectric layer. The aperture admittance and capacitance at various frequencies and thicknesses are calculated for various dielectrics. It is shown that, for d>or=2b, the results are very close to those for the infinitely thick dielectric medium. The results are expected to be useful in developing suitable procedures for measuring the electrical properties of samples with small thicknesses.<<ETX>>\",\"PeriodicalId\":404761,\"journal\":{\"name\":\"7th IEEE Conference on Instrumentation and Measurement Technology\",\"volume\":\"70 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-02-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"7th IEEE Conference on Instrumentation and Measurement Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMTC.1990.65956\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"7th IEEE Conference on Instrumentation and Measurement Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMTC.1990.65956","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

摘要

采用谱域方法分析了以导体背压介质层为端接的开放式同轴线的孔径场和孔径导纳。计算了不同介质在不同频率和厚度下的孔径导纳和电容。结果表明,当d>或=2b时,结果与无限厚介质的结果非常接近。这些结果有望有助于开发合适的方法来测量小厚度样品的电性能
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A study on the metal-flanged open-ended coaxial line terminating in a conductor-backed dielectric layer
A spectral domain approach is used to analyze aperture fields and aperture admittance of an open-ended coaxial line terminated by a conductor-backed dielectric layer. The aperture admittance and capacitance at various frequencies and thicknesses are calculated for various dielectrics. It is shown that, for d>or=2b, the results are very close to those for the infinitely thick dielectric medium. The results are expected to be useful in developing suitable procedures for measuring the electrical properties of samples with small thicknesses.<>
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信