基于中值阈值的EEPROM-PUF概念在高温SOI CMOS技术中实现的评估

Benjamin Willsch, Marius te Heesen, J. Hauser, S. Dreiner, H. Kappert, H. Vogt
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引用次数: 2

摘要

物理不可克隆函数(puf)是一种新型的有硬件限制的密码原语。puf利用随机过程变化生成适合在低成本设备识别和身份验证应用程序中使用的唯一密钥。由于密钥通常来自大量半导体设备,因此在非易失性存储器中实现puf的空间和功耗节省很有吸引力。本文对采用高温1 ßm SOI CMOS技术制造的68个EEPROM阵列进行了基于中值阈值的PUF概念的实验评估。这个概念的现有实现在生成密钥的随机性和唯一性方面产生了较差的结果,其平均汉明间距离仅为30.24%(理想值为50%)。观察到的偏置可以归因于EEPROM阵列的不对称单元布局引起的系统趋势的存在。为了减轻系统过程变化的影响,提出了一个简单的优化程序,该程序可将平均汉明间距离显著提高18个百分点以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of a median threshold based EEPROM-PUF concept implemented in a high temperature SOI CMOS technology
Physically Unclonable Functions (PUFs) are a new type of hardware-bounded cryptographic primitives. PUFs leverage random process variations to generate unique keys suitable for the use in low-cost device identification and authentication applications. Since the keys are typically derived from a large number of semiconductor devices, a space- and power-saving implementation of PUFs in non-volatile memory is appealing. In this paper, a median threshold based PUF concept was experimentally evaluated for 68 EEPROM arrays fabricated in a high temperature 1 ßm SOI CMOS technology. As-is realization of the concept yielded poor results regarding the randomness and uniqueness of the generated keys featuring an average inter-Hamming distance of only 30.24% (ideal value: 50%). The observed bias could be attributed to the presence of systematic trends induced by an asymmetric cell layout of the EEPROM arrays. To mitigate the effect of systematic process variations, a simple optimization procedure is proposed that has significantly increased the average inter-Hamming distance by more than 18 percentage points.
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