{"title":"用紫外切边技术控制微环谐振器加/降滤波器阵列的通道间距","authors":"S. Suzuki, Y. Hatakeyama, Y. Kokubun, S. Chu","doi":"10.1109/FOPC.2002.1015802","DOIUrl":null,"url":null,"abstract":"In the multi-channel microring resonator filter, the wavelength channel spacing was limited to 5.7 nm due to the resolution limit of the photomask (50 nm). Therefore, we developed a new technique to control precisely the channel spacing by a UV-trimming technique using polysilane as the over-cladding layer. As a result, we successfully decreased the channel spacing to 0.5 nm, and also controlled the channel spacing precisely to 1.0 nm using the same trimming technique.","PeriodicalId":117784,"journal":{"name":"Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components (Cat.No.02EX595)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Channel spacing control of microring resonator add/drop filter array by UV trimming technique\",\"authors\":\"S. Suzuki, Y. Hatakeyama, Y. Kokubun, S. Chu\",\"doi\":\"10.1109/FOPC.2002.1015802\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the multi-channel microring resonator filter, the wavelength channel spacing was limited to 5.7 nm due to the resolution limit of the photomask (50 nm). Therefore, we developed a new technique to control precisely the channel spacing by a UV-trimming technique using polysilane as the over-cladding layer. As a result, we successfully decreased the channel spacing to 0.5 nm, and also controlled the channel spacing precisely to 1.0 nm using the same trimming technique.\",\"PeriodicalId\":117784,\"journal\":{\"name\":\"Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components (Cat.No.02EX595)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-08-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components (Cat.No.02EX595)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/FOPC.2002.1015802\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 2002 IEEE/LEOS Workshop on Fibre and Optical Passive Components (Cat.No.02EX595)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/FOPC.2002.1015802","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Channel spacing control of microring resonator add/drop filter array by UV trimming technique
In the multi-channel microring resonator filter, the wavelength channel spacing was limited to 5.7 nm due to the resolution limit of the photomask (50 nm). Therefore, we developed a new technique to control precisely the channel spacing by a UV-trimming technique using polysilane as the over-cladding layer. As a result, we successfully decreased the channel spacing to 0.5 nm, and also controlled the channel spacing precisely to 1.0 nm using the same trimming technique.