T. Ohguro, R. Hasumi, T. Ishikawa, M. Nishigori, H. Oyamatsu, F. Matsuoka
{"title":"一种用于改善低电源电压下闪烁噪声的外延沟道MOSFET","authors":"T. Ohguro, R. Hasumi, T. Ishikawa, M. Nishigori, H. Oyamatsu, F. Matsuoka","doi":"10.1109/VLSIT.2000.852809","DOIUrl":null,"url":null,"abstract":"We investigated the analog performance of a 0.11 /spl mu/m CMOS under a low supply voltage. In order to avoid flicker noise degradation under the low supply voltage, an epitaxial channel MOSFET without halo implantation was shown to be effective.","PeriodicalId":268624,"journal":{"name":"2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"An epitaxial channel MOSFET for improving flicker noise under low supply voltage\",\"authors\":\"T. Ohguro, R. Hasumi, T. Ishikawa, M. Nishigori, H. Oyamatsu, F. Matsuoka\",\"doi\":\"10.1109/VLSIT.2000.852809\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We investigated the analog performance of a 0.11 /spl mu/m CMOS under a low supply voltage. In order to avoid flicker noise degradation under the low supply voltage, an epitaxial channel MOSFET without halo implantation was shown to be effective.\",\"PeriodicalId\":268624,\"journal\":{\"name\":\"2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-06-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.2000.852809\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2000.852809","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An epitaxial channel MOSFET for improving flicker noise under low supply voltage
We investigated the analog performance of a 0.11 /spl mu/m CMOS under a low supply voltage. In order to avoid flicker noise degradation under the low supply voltage, an epitaxial channel MOSFET without halo implantation was shown to be effective.