溶胶-凝胶法制备氧化铟导电材料结构的理化研究

V. Sachkov, S.L. Krutz, T. Malinovskaya
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引用次数: 0

摘要

众所周知,锡合金氧化铟是一种具有高导电性的n型半导体,根据制备条件和材料种类(单晶、陶瓷、薄膜)的不同,其导电性在10 × 10/sup -4 ~ 5 × 10/sup -4/ S/m之间变化。在合金氧化铟的基础上获得导电材料的一种有前途的方法是基于金属氢氧化物的联合沉积的溶胶-凝胶法,并在热处理时形成以下的氧化物结晶。本文讨论了在硝酸溶液和盐酸溶液中共沉淀铟锡氢氧化物热处理过程中铟锡氧化体系的相形成和自由电子(Ne)浓度变化的研究结果,以及用碱性反应物(NH/sub - 4/OH)比较硝酸盐熔体的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Physical-chemical research of conductive materials structure on the basis of indium oxide obtained by sol-gel method
It is known that indium oxide alloyed by tin is a semiconductor of n-type with high conductivity, depending on preparation conditions and kind of a material (monocrystals, ceramics, thin films) varies within from 10/sup -4/ up to 5*10/sup 4/ S/m. One of perspective ways of obtaining a current-conducting material on the basis of alloyed indium oxide is the sol-gel method based on a joint deposition of hydroxides of metals with the following crystallization of oxides at heat treatment. In this paper, the results of investigation of phase formation and change of concentration of free electrons (Ne) in indium tin oxide system during heat treatment of coprecipitated hydroxides of indium and tin from nitric and muriatic solutions and also for comparison melts of salt nitrates by an alkaline reactant (NH/sub 4/OH) are considered.
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