弹道(n,0)碳纳米管场效应晶体管的I-V特性:n=3a+1和n=3a+2的比较

G. Karimi, S. G. Shirazi
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引用次数: 6

摘要

由于晶体管尺寸的缩放出现了严重的障碍,已经明显地证明了硅技术应该被一种新的技术所取代,这种技术具有克服纳米尺度障碍的高能力。在众多候选器件中,碳纳米管(CNT)场效应晶体管被认为是最有希望取代硅基技术的器件。由于这些晶体管的通道是由碳纳米管制成的,因此它的性质,如手性矢量,对决定器件的性能有显著的影响。本文研究了碳纳米管直径对掺杂源极/漏极扩展的同轴门控碳纳米管隧穿电流和热离子发射电流的影响。该晶体管的源/通道/漏极是具有(n,0)手性的之字形碳纳米管。“n”值可以是n = 3a + 1或n = 3a + 2的形式。随着“a”的增大,碳纳米管的直径增大,能带隙EG减小;因此,通过增加“a”值,开/关电流比减小。然而,当n = 3a + 2时,碳纳米管的EG值更高;那么在给定的“a”下,当n = 3a + 1时,由于EG较低,因此隧道和TE电流较高,通/关电流比可能会降低。通常,对于小直径器件,亚阈值摆幅改善,阈值电压增加;因此,泄漏电流可以减小。通状态电流和输出电导的值越大,直径越大。此外,当n = 3a +1和n = 3a + 2时,器件的EG和I-V特性之间的差异对于较大的直径值可以忽略不计。所有结果都可以通过器件能带图上的能位分辨电子密度和电流谱来验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ballistic (n,0) Carbon Nanotube Field Effect Transistors' I-V Characteristics: A Comparison of n=3a+1 and n=3a+2
Due to emergence of serious obstacles by scaling of the transistors dimensions, it has been obviously proved that silicon technology should be replaced by a new one having a high ability to overcome the barriers of scaling to nanometer regime. Among various candidates, carbon nanotube (CNT) field effect transistors are introduced as the most promising devices for substituting the silicon-based technologies. Since the channel of these transistors is made of CNT then its properties, such as chiral vector, have prominent effects on determining the performance of devices. In this paper the CNT diameter impact on tunneling and thermionic emission TE currents of a coaxially-gated CNTFET with doped source/drain extensions is investigated. The source/channel/drain of this transistor are a zigzag CNT with (n,0) chirality. The “n” value could be in the form of n = 3a + 1 or n = 3a + 2. By increasing the “a”, the diameter increases while the energy band gap EG of the CNT decreases; as a result by increasing the “a” value, the on/off current ratio decreases.  However, for n = 3a + 2 the EG of a CNT shows a higher value; then at a given “a”, for  n = 3a + 1 the on/off current ratio may decrease due to a lower EG and hence higher tunneling and TE current. Generally, subthreshold swing improves and threshold voltage increases for a lower diameter device; consequently, the leakage current could diminish. ON-state current and output conductance have higher values for a higher diameter. Also, the difference between EG and hence the I-V characteristics of the device with n = 3a +1 and n = 3a + 2 is negligible for a higher diameter value. All the results could be justified based on the energy-position resolved electron density and current spectrums on energy band diagram of the device.
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