V1-xWxO2在金属绝缘子转变温度周围的输运性质

G. Naziripour, E. Shin, G. Subramanyam, N. Dilley, S. Ramanarhan, G. Farlow, V. Vasiliev, B. Claflin, D. Look
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引用次数: 0

摘要

研究了脉冲激光沉积制备的w掺杂热致变色V1-xWxO2 (x=0和0.0074)薄膜的输运性质,以了解掺杂对薄膜电学性能的影响。在高达9特斯拉的磁场下,对薄膜二氧化钒(VO2)在Mott金属-绝缘体转变(MIT)上进行了温度相关的磁输运测量(霍尔效应)。在MIT,霍尔载流子密度增加了4个数量级。霍尔迁移率变化不大,保持在~ 0.05 cm2 /V秒。大多数载流子是电子。磁阻小且为正。本文报道了不同掺杂水平在金属态和绝缘态下载流子浓度、电导率和迁移率三个霍尔参数的比较,并提出了一个模型。载流子浓度与VO2薄膜电导率之间存在相关性,但载流子浓度与迁移率之间不存在相关性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transport properties of V1-xWxO2 around the metal insulator transition temperature
The transport properties of W-doped thermochromic V1-xWxO2 (x=0 and 0.0074) thin films prepared by pulsed laser deposition were studied to understand the effect of doping on the electrical properties of these films. Temperature dependent magneto-transport measurements (Hall effect) in magnetic fields up to 9 Tesla were performed on thin film vanadium dioxide (VO2) across the Mott metal-insulator transition (MIT). The Hall carrier density increases by 4 orders of magnitude at MIT. The Hall mobility varies little across the MIT and remains low at ~ 0.05 cm2 /V sec. The majority carriers are electrons. Magneto-resistance is small and positive. Comparison of the three Hall parameters including carrier concentration, conductivity and mobility between various doping levels on both metallic and insulating state are reported and a model has been proposed. A correlation between carrier concentration and conductivity of VO2 films is observed but doesn’t exist between carrier concentration and mobility.
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