基于C型电枢柔度匹配的混合电枢设计

G. Goyal, J. P. Khatait, Shubhabrata Mukherjee
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引用次数: 0

摘要

电磁发射器(EML)中最常用的金属电枢是c型电枢和多纤维电枢。电刷电枢具有较短的电流路径,因此具有较小的欧姆损耗。然而,电刷电枢缺乏抗压刚度,无法在电流上升和下降期间提供机械接触力。此外,从结构上看,电刷电枢在运行过程中缺乏接受极端机械负荷的机械强度。本文提出了一种混合电枢设计,结合了c型电枢和刷电枢弹丸技术的特点。该设计从一个单片实心块电枢开始,以提供短电流路径。然后应用柔性机构设计方法在接触面上提供等于c型电枢的机械柔性。由此产生的混合电枢在电磁(EM)力不足时为电流传导提供机械压力,但电枢内的电流路径也最小,以减少欧姆损耗。给出了混合电枢和c型电枢的接触压力分布、接触面电流密度、初速和效率的对比图。由此产生的混合电枢的寄生质量减少了33%,有效载荷的动能增加了22%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hybrid Armature Design Based on Compliance Matching with C Armatures
The most common metal armatures used in an Electro-Magnetic Launcher (EML) are the C-armatures and the multi-fiber brush armatures. A brush armature has a shorter current path and thus has a less ohmic loss. Nevertheless, brush armatures lack compressive stiffness to provide mechanical contact forces at the current ramp-up and ramp-down periods. Also, by construction, brush armatures lack the mechanical strength to accept extreme mechanical loads during operation. This article presents a hybrid armature design that incorporates qualities of both C-armature and brush armature projectile technologies. The design starts with a monolithic solid block armature to provide a short current path. Compliant mechanism design methods are then applied to provide mechanical compliance at the contact surface equal to a C-armature. The resulting hybrid armature provides mechanical pressure for current conduction when electromagnetic (EM) forces are insufficient, but the current path inside the armature is also minimum to reduce Ohmic loss. Plots are provided that compares contact pressure distribution, contact surface current density, muzzle velocity, and efficiency of the hybrid armature and a C-armature. The resulting hybrid armature has 33% less parasitic mass that delivers 22% higher kinetic energy to the payload.
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