用于模拟/混合信号SOC应用的GaAs衬底上的缩小JL DG MOSFET的RF/模拟和线性性能分析

Biswajit Baral, S. Biswal, S. Swain, S. K. Das, D. Nayak, Dhananjaya Tripathy
{"title":"用于模拟/混合信号SOC应用的GaAs衬底上的缩小JL DG MOSFET的RF/模拟和线性性能分析","authors":"Biswajit Baral, S. Biswal, S. Swain, S. K. Das, D. Nayak, Dhananjaya Tripathy","doi":"10.1109/DEVIC.2019.8783341","DOIUrl":null,"url":null,"abstract":"With time the design of RF and Analog application based circuits in MOSFET industry is changing and day by day it's becoming more and more difficult as device modeling has now entered the deep-subnanometer regime. Performance of junction less transistor is remarkable in digital application due to their ease of fabrication and superior SCEs. This paper highlights the DC, ANALOG, RF and LINEARITY performance of a Junction less Double Gate MOSFET (JL DG MOSFET) by downscaling the Channel length with the help of numerical TCAD device simulator (SILVACO). The figure of merits for DC, ANALOG, RF & LINEARITY parameters for example Transconductance $(\\mathrm{g}_{\\mathrm{m}})$, Gain transconductance frequency product (GTFP), output resistance $(\\mathrm{R}_{\\mathrm{o}\\mathrm{u}\\mathrm{t}})$, cut-off frequency $(\\mathrm{f}_{\\mathrm{T}})$, Gain bandwidth product (GBW), Transconductance generation factor $(\\mathrm{g}_{\\mathrm{m}}/\\mathrm{I}_{\\mathrm{d}})$, maximum frequency $(\\mathrm{f}_{\\max})$, Intermodulation distortion (IMD), variable intercept point (VIP) are studied and impact of downscaling in gate length have been recorded. The results conclude that down scaled junction less DG MOSFET show a great pledge to turn out to be a feasible competitor for use in SOC application.","PeriodicalId":294095,"journal":{"name":"2019 Devices for Integrated Circuit (DevIC)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"RF/Analog & Linearity performance analysis of a downscaled JL DG MOSFET on GaAs substrate for Analog/mixed signal SOC applications\",\"authors\":\"Biswajit Baral, S. Biswal, S. Swain, S. K. Das, D. Nayak, Dhananjaya Tripathy\",\"doi\":\"10.1109/DEVIC.2019.8783341\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"With time the design of RF and Analog application based circuits in MOSFET industry is changing and day by day it's becoming more and more difficult as device modeling has now entered the deep-subnanometer regime. Performance of junction less transistor is remarkable in digital application due to their ease of fabrication and superior SCEs. This paper highlights the DC, ANALOG, RF and LINEARITY performance of a Junction less Double Gate MOSFET (JL DG MOSFET) by downscaling the Channel length with the help of numerical TCAD device simulator (SILVACO). The figure of merits for DC, ANALOG, RF & LINEARITY parameters for example Transconductance $(\\\\mathrm{g}_{\\\\mathrm{m}})$, Gain transconductance frequency product (GTFP), output resistance $(\\\\mathrm{R}_{\\\\mathrm{o}\\\\mathrm{u}\\\\mathrm{t}})$, cut-off frequency $(\\\\mathrm{f}_{\\\\mathrm{T}})$, Gain bandwidth product (GBW), Transconductance generation factor $(\\\\mathrm{g}_{\\\\mathrm{m}}/\\\\mathrm{I}_{\\\\mathrm{d}})$, maximum frequency $(\\\\mathrm{f}_{\\\\max})$, Intermodulation distortion (IMD), variable intercept point (VIP) are studied and impact of downscaling in gate length have been recorded. The results conclude that down scaled junction less DG MOSFET show a great pledge to turn out to be a feasible competitor for use in SOC application.\",\"PeriodicalId\":294095,\"journal\":{\"name\":\"2019 Devices for Integrated Circuit (DevIC)\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 Devices for Integrated Circuit (DevIC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DEVIC.2019.8783341\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Devices for Integrated Circuit (DevIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEVIC.2019.8783341","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

随着时间的推移,MOSFET工业中基于射频和模拟应用的电路设计也在不断变化,随着器件建模进入深亚纳米阶段,设计难度也越来越大。无结晶体管由于其易于制造和优越的晶圆结构而在数字应用中表现突出。本文在数值TCAD器件模拟器(SILVACO)的帮助下,通过减小通道长度,重点介绍了无结双栅极MOSFET (JL - DG MOSFET)的直流、模拟、射频和线性性能。直流、模拟、射频和线性参数的优点图,例如跨导$(\ mathm {g}} {\ mathm {m}})$、增益跨导频率积(GTFP) $、输出电阻$(\ mathm {R}} {\ mathm {o}\ mathm {u}\ mathm {t}})$、截止频率$(\ mathm {f}} {\ mathm {t}})$、增益带宽积(GBW)、跨导产生因子$(\ mathm {g}} {\ mathm {m}}/\ mathm {I}} {\ mathm {d}} $、最大频率$(\ mathm {f}} {\max})$、互调失真(IMD)、对可变截距点(VIP)进行了研究,记录了栅极长度降尺度的影响。结果表明,小尺寸无结DG MOSFET在SOC应用中显示出巨大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
RF/Analog & Linearity performance analysis of a downscaled JL DG MOSFET on GaAs substrate for Analog/mixed signal SOC applications
With time the design of RF and Analog application based circuits in MOSFET industry is changing and day by day it's becoming more and more difficult as device modeling has now entered the deep-subnanometer regime. Performance of junction less transistor is remarkable in digital application due to their ease of fabrication and superior SCEs. This paper highlights the DC, ANALOG, RF and LINEARITY performance of a Junction less Double Gate MOSFET (JL DG MOSFET) by downscaling the Channel length with the help of numerical TCAD device simulator (SILVACO). The figure of merits for DC, ANALOG, RF & LINEARITY parameters for example Transconductance $(\mathrm{g}_{\mathrm{m}})$, Gain transconductance frequency product (GTFP), output resistance $(\mathrm{R}_{\mathrm{o}\mathrm{u}\mathrm{t}})$, cut-off frequency $(\mathrm{f}_{\mathrm{T}})$, Gain bandwidth product (GBW), Transconductance generation factor $(\mathrm{g}_{\mathrm{m}}/\mathrm{I}_{\mathrm{d}})$, maximum frequency $(\mathrm{f}_{\max})$, Intermodulation distortion (IMD), variable intercept point (VIP) are studied and impact of downscaling in gate length have been recorded. The results conclude that down scaled junction less DG MOSFET show a great pledge to turn out to be a feasible competitor for use in SOC application.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信