{"title":"超大规模集成电路中试线的统计过程控制与六西格玛驱动","authors":"P. Nixon, J. Conway, J. Maimon","doi":"10.1109/IEMT.1993.398199","DOIUrl":null,"url":null,"abstract":"The requirements of semiconductor device manufacturing and defense industry needs are continually demanding tighter process control and reduced levels of defects. Statistical process control (SPC) techniques are required to meet these requirements. The VLSI pilot line has implemented SPC control in manufacturing on all products. Online charts are used to identify and correct problems as quickly as possible and capability indices are used to drive continuous improvement.<<ETX>>","PeriodicalId":206206,"journal":{"name":"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Statistical process control and the drive for six sigma in a VLSI pilot line\",\"authors\":\"P. Nixon, J. Conway, J. Maimon\",\"doi\":\"10.1109/IEMT.1993.398199\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The requirements of semiconductor device manufacturing and defense industry needs are continually demanding tighter process control and reduced levels of defects. Statistical process control (SPC) techniques are required to meet these requirements. The VLSI pilot line has implemented SPC control in manufacturing on all products. Online charts are used to identify and correct problems as quickly as possible and capability indices are used to drive continuous improvement.<<ETX>>\",\"PeriodicalId\":206206,\"journal\":{\"name\":\"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium\",\"volume\":\"41 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-10-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEMT.1993.398199\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.1993.398199","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Statistical process control and the drive for six sigma in a VLSI pilot line
The requirements of semiconductor device manufacturing and defense industry needs are continually demanding tighter process control and reduced levels of defects. Statistical process control (SPC) techniques are required to meet these requirements. The VLSI pilot line has implemented SPC control in manufacturing on all products. Online charts are used to identify and correct problems as quickly as possible and capability indices are used to drive continuous improvement.<>