温度对射频磁控溅射制备Co60辐照CeOX薄膜光学性能的影响

Hui Wang, Bo Fu, Zaikui Xiang
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引用次数: 0

摘要

用于航天船的窗户是由熔融二氧化硅和光学薄膜组成的,可以抵抗宇宙间的射线照射。对于射频磁控溅射制备的光学薄膜,其抗射线辐照性能与溅射温度和退火温度有关。作为多层光学薄膜光学设计的高折射率材料之一,CeOx薄膜分别暴露于107、108和109rad(Si)的Co60辐照下。光谱传输线显示了辐照前后的光学特性。由于薄膜内部的缺陷随着温度的升高而减少,溅射温度和退火温度越高,薄膜的抗辐照性能越好。Ce3+和Ce4+的变换有利于光学性质的改善,E′中心可以从可见光波段移动到紫外波段。但随着辐照强度的提高,微观结构是决定氧化铈膜抗辐照性能的关键。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of temperature on optical properties of CeOX film being irradiated by Co60 prepared by RF magnetron sputtering
The windows for the aerospace ship application is consist of fused silica and optical-films which can resist the ray-irradiation among the cosmos. For the optical-films produced by RF magnetron sputtering, the ray-irradiation anti-resist character is related with the sputtering temperature and the annealing temperature. As one of the high refractive index materials for the optical-design of the multi-layer optical film, CeOx film were exposed to Co60 irradiation of 107 、108 、and109rad(Si) respectively. The spectrum- transmission line showed the optical character before and after the irradiation. Due to the decreasing of the defect among the film with the raising of the temperature ,the higher the sputtering and annealing temperature, the well anti-irradiation character. The transform of the Ce3+ and Ce4+ is beneficial for the optical character while the E’ center can be moved from the visible-band to the ultraviolet band. But with the raising of the irradiation does, the micro-structure is key for the anti-irradiation character of the CeOx film.
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