无线应用中四端InGap/GaAs比特的DC/RF及统计建模

C. Wei, A. Metzger, Y. Zhu, C. Cismaru, A. Klimashov, P. Zampardi, R. Ramanrata, Y. Tkachenko
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引用次数: 4

摘要

基于InGaP-GaAs的BIFET是一种将HBT和FET集成到单个晶圆上的新技术。该技术扩展了电路的功能并降低了成本。开发了一种新的四端大信号模型,用于精确的直流和射频应用。该器件有一个p层作为后门,对DC/RF特性有重大影响,因此漏极电流、栅极电流、漏电流和所有电荷/电容都是三维函数,这增加了模型的复杂性。该模型可以很好地预测所有配置的IV/泄漏曲线,包括当后门连接到源或门时,设备减少到三端。对于三种终端情况,该模型还可以预测射频性能。此外,本文还提出了一种统计模型来预测Idss/Vp的变化,以及定义外延层结构特征极值的角点模型
本文章由计算机程序翻译,如有差异,请以英文原文为准。
DC/RF and Statistic Modeling of Four Terminal InGap/GaAs Bifet for wireless application
InGaP-GaAs based BIFET is a novel technology that integrates HBT and FET onto a single wafer. The technique expands functionality of circuits and reduces the cost. A novel four-terminal large-signal model was developed for accurate DC and RF applications. The device has a p-layer as backgate that has significant impact on the DC/RF characteristics and therefore, the drain current, gate current, leakage current and all charges/capacitances are 3-dimensional functions, which increases the complexity of the model. The model predicts very well IV/leakage curves for all configurations, including the cases when backgate is connected to source or to gate in that the device reduces to three-terminal. For the three terminal cases, the model also predicts RF performances. Statistic model is also presented to predict the variation of Idss/Vp as well as the corner models that define the extremes of characteristics in terms of epi-layer structure
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