皮秒激光等离子体相互作用中的强Kα发射

Shortwavelength V: Physics with Intense Laser Pulses Pub Date : 1993-11-01 DOI:10.1063/1.354240

B. Soom, Hong Chen, Y. Fisher, D. Meyerhofer

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引用次数: 28

摘要

在4 × 1015 W/cm2的皮秒、1.05 μm激光脉冲与涂有不同厚度铝的硅靶相互作用下，观察到了Kα的发射。强Kα发射需要p偏振、高强度对比激光脉冲。在7.1 Å下，Kα产率为1.5 × 108光子/sr，发射持续时间为~8 ps，源面积为1.6 × 10-6 cm2。辐射度为~3 × 109 W/cm2 sr。蒙特卡罗模拟表明，在这些条件下，Kα发射是获得~1.5 Å高效超短x射线源的有希望的候选。

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Strong Kα Emission in Picosecond Laser-Plasma Interactions

Kα emission is observed from the interaction of a picosecond, 1.05-μm laser pulse at 4 × 1015 W/cm2 with a silicon target coated with various thicknesses of aluminum. Strong Kα emission requires a p-polarized, high-intensity-contrast laser pulse. At 7.1 Å, the Kα yield is 1.5 × 108 photon/sr with a duration of emission of ~8 ps and a source area of 1.6 × 10‒6 cm2. The radiance is ~3 × 109 W/cm2 sr. Monte-Carlo simulations have suggested that under these conditions Kα emission is a promising candidate to obtain an efficient, ultrashort x-ray source at ~1.5 Å.

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Shortwavelength V: Physics with Intense Laser Pulses

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