在深低温下工作的先进双极晶体管中的新型集电极电流现象

A. Joseph, J. Cressler, D. M. Richey
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引用次数: 1

摘要

我们在液氮温度(LNT=77.3K)以下工作的所有先进双极晶体管中观察到的一个独特现象是,在非常低的注入水平下,非理想集电极电流的发展。阱辅助载流子通过基极势垒从发射极隧穿到集电极被认为是造成这种现象的机制。通过使用校准过的低温Si/SiGe双极晶体管一维模拟器SCORPIO对电子隧穿跃迁概率进行建模,解释了SiGe双极晶体管和Si双极晶体管之间集电极泄漏电流对温度依赖性的差异。本研究采用了一种具有多晶硅发射极触点的自对准、浅沟和深沟隔离、外延基晶体管。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Novel collector current phenomenon in advanced bipolar transistors operated at deep cryogenic temperatures
A unique phenomenon that we have observed in all advanced bipolar transistors operating below liquid-nitrogen temperature (LNT=77.3K) is the development of a nonideal collector current at very low injection levels. A trap-assisted tunneling of carriers from the emitter to the collector through the base potential barrier is suggested as the mechanism responsible for this observed phenomenon. The differences in the temperature dependence of the collector leakage current between SiGe HBTs and Si BJTs is explained by modelling the electron tunneling transition probability from the emitter region to traps located in the neutral-base using SCORPIO, a calibrated 1-D simulator for low-temperature Si/SiGe bipolar transistors. A self-aligned, shallow- and deep-trench isolated, epitaxial-base transistor with a polysilicon emitter contact was used in the present investigation.
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